TARGET

METAL Research on the fabrication of metal targets using spherical metal and alloy powders

CERAMIC Research on the fabrication of ceramic targets using spherical ceramic powders, and on the fabrication of superconducting targets

GLASS Research on the fabrication of glass targets using hot pressing

ROTARY Research and development of cylindrical targets and cathodes

COATING

APS Research and development of insulating and dielectric coatings for electrostatic chucks in semiconductor and ceramic applications

SPS Research on in-plasma coating for semiconductor chambers and liners

AD Research on in-plasma coating for semiconductor chambers and lids

SPECIAL COTING

PVD e-beam evaporation Research on the relationship between physical vapor deposition (PVD) conditions—such as filament, power, vacuum level, gas partial pressure, temperature, and source—and coating quality
dc magnetron sputtering Research on the relationship between physical vapor deposition (PVD) conditions—such as erosion zone uniformity, gas partial pressure, magnetic field uniformity, temperature, and target—and coating quality
rf sputteringResearch on the relationship between physical vapor deposition (PVD) conditions—such as matching, erosion zone uniformity, gas partial pressure, magnetic field uniformity, temperature, and target—and coating quality

CVD Research on the relationship between chemical vapor deposition (CVD) conditions—such as chamber configuration, precursor, nozzle, showerhead, and temperature—and coating quality

ALD Research on the relationship between atomic layer deposition (ALD) conditions—such as chamber configuration, precursor, nozzle, temperature, and plasma—and coating quality

e-gun

e-gun Development of a 400-kilowatt-class high-power piercing electron beam system and control system

ion-gun

ion-gun Development of a large-area, high-uniformity ion beam system and control system

Cleaning

Laser Research and development of dry surface contamination removal technology using high-power lasers

CO₂ Surface contamination removal technology using low-temperature, high-pressure carbon dioxide (CO₂)

LN₂ Development of surface contamination removal technology using cryogenic liquid nitrogen