We have developed a multi-electrode plasma gun that overcomes the drawbacks of unmelted particles 발생 in pulse DC voltage operation of conventional single-electrode plasma coating guns.
In APS equipment, coating thickness, density, surface roughness, and adhesion can be optimized by precisely controlling parameters such as plasma current and voltage, gas type and flow rate, powder feed rate, substrate travel speed and distance, and nozzle position.
In AD equipment, coating thickness, density, and surface roughness can be optimized by controlling parameters such as coating material feed rate, substrate travel speed and distance, and nozzle position.
In PVD equipment, thin-film thickness, uniformity, and crystallinity can be optimized by controlling chamber pressure, process gases, substrate temperature, target-to-substrate distance, and deposition time.
Benefits of Greenresource
Electric and magnetic field analysis (ANSYS)
In-house magnet fabrication
Thin-film quality development enabled through a wide range of R&D facilities
In ALD equipment, thin-film thickness, uniformity, composition, and crystallinity can be precisely controlled by adjusting precursor type and injection time, chamber temperature, reaction and purge times, and the number of deposition cycles. Nanometer-scale thickness control is achievable.
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